Infrastructure and Technical Support

Synthesis of Nanomaterials Laboratory. SYNANO, RedLab 361

Synthesis of CNTs macroscopic fiber unit
Three areas for growth of fiber furnace
Injection system adjustable for SWNT MWNT spectrum growth
Addition system of dopants during CVD reaction
Porosity control by injection/temperature profile
Treatment of CNTs fibers unit
System of coils for collecting materials
Differential speed to stretch the material and yarn in the range speed control 5- 100 m/min
Liquid spray system to densify fibers
Equipment to entering liquid or polymer into porous fibers
System line of impregnation with resins and thermoplastic
Laminated nanomaterials synthesis unit
Oven for laminated materials growth by CVD
System of growth continuous through movement of substrates
Rapid cooling of reaction system
Adaptation to growth on unconventional substrates (e.g. CF)
Synthesis of nanomaterials by electrospinning unit
Electrospinning of polymer fibers and metal protofibres and metallic oxides
Different surfaces of membranes collection: Rotary, flat substrate, mesh
Electrospinning of coaxial fibers
Multiple injection head
System of heat treatment for crystallization of inorganic fibers
Production unit of nanocomposites
Plastic and metal molds for production of nanocomposites according to standards
System degassing of high volume (> 1 L) and with control of temperature (up to 248° F)
Curing ovens, including vacuum
Measurement of real temperature and electrical resistance during curing
Curing power system
Dispersion unit of nanoparticles in polymer matrices
Dispersion system of nanoparticles in polymer matrices
Control of parameters of shear: (50º F - 248° F) temperature, speed and separation between rollers
Measurement of electrical resistance during different stages of processing

Micro and Nanofabrication Laboratory. NanoFabLab, RedLab 363

SEM Carl Zeiss microscope of UHR, Auriga model with canon IBF charged in cross beam geometry
Detectors ET secondary electrons, secondary InLenss, EsB InLenss and STEM detector
System for lithography EBeam, FIB and GIS: Raith Multibeam; high resolution with 32-bit DAC and 20 MHz. system controller for NanoPecs proximity effect correction
Optical lithography system without Heidelberg Instruments Gmbh. Modelo mask DWL66fs. With two-headed writing of 4 and 2 mm. With a resolution of up to 0.6 microns in fields of 20x20cm2 script. Pneumatic or optical autofocus system. Double-sided alignment system
ALD, Cambridge model Fiji atomic layer deposition system ultratech. With 6 lines of thermal precursors and precursors of plasma 6 lines
Optical microscopes Leica DM4000M, DM750M, M12
Diamond saw Buehler Isomet 1000
High-precision Scriber OptoPhase Scriber MR200
Semi-automatic encapsulator
Wire ball/wedge/bump bonder. TPT 16B
Ultra fast thermal annealing RTP. Annealsys model AsMicro
Con 1x MFC for O2 & N2
Chemical attack by RIE ultra reactive ion beam compact-PlasmaPld-JLS designs
Dry etching by reactive ion CryoICPDRIE for silicon and dielectric beam model 100/65 ICPDRIE of Oxford Plamsa Ltd
MHz plasma attack for Ar2, O2, N2 and CF4. Model GigaBatch of TePla
Profile meter mechanic Dektak KX Bruker
Thermal evaporator for metals in atmosphere of HV (Cr, Au, or, the) model of Vacuum Science Ltd. Oxford Nanosphere
Thermal evaporator for metals in atmosphere of HV (Pd, Pt, Ag, to the) model Univex300 of Oerlikon leybold Gmbh
Four-headed with porta station samples thermostated Everbeing EB6, and parameters Analyzer model Keithley 4200SCS
System characterization pulltester chatillon TCM 201 of Ametek
System for growth of Graphene by CVD, model Cube from NanoInnova

Advanced Optical characterization Laboratory. LabCOA, Redlab 279

Two optical cryostats for optical, electrical and Acoustic measurements (1.2 K - 300 K): variable temperature, shown with diameter up to 40 mm
Liquid nitrogen-cooled CCD spectrograph (300 nm-1000 nm): 1340 x 400 pixel, quantum efficiency up to 95%
Pulsed ND: YAG lasers and continuous (1064 nm, 532 nm, 355 nm)
Laser diode (single longitudinal mode) with spectral confocal scanner (630 nm 1550 nm (depends on diode)): 630 nm 1550 nm (depends on diode))
Laser OPO (225.5 1750 nm nm): in process of acquisition
Electronic equipment for measurement of fluorescence lifetime (timecorrelated single photon counting, TCSPC) (50 ps 1 us)
Fast digital real time oscilloscope (width frequency 4 GHz, 40 GS/s): Up to 1 MHz repetition rate
Digitizer (200 MHz, 250 MS/s, 14 bit): 2-channel
Signal generator (9 kHz 6500 MHz, +13 dBm)
Table 2D motorized scanned fluorescence and fluorescence lifetime microscopy (25 mm x 25 mm2): lower step: 50 nm
Homebuilt for excitation electronics down and sensory detection phase of high-frequency ultrasonic waves

Structure-Performance Relationship Under Work Conditions Laboratory. OPERANDO Lab, RedLab 363

X ray diffractometer. The laboratory has two teams that can be used in different applications in function of the materials or of the type of test. PaNalytical Empyrean can be measures in mode reflection, transmission, flush angle and low angle. Bruker D8 Advance Este equipment in addition to the standard measures allows has a rotating platform to measure capillary transmission. On the other hand, has associated with an ANTON PAAR XRK900 reaction Chamber to measure up to 1173 K in vacuum or in different atmospheres (range 0. 00110 bar). Also has the option of working with x-ray radiation of high energy (Ag) X allows information about the order of short-range in amorphous materials or nanoparticulated through the study by "pair distribution function"

UV Visible near-infrared spectrophotometer Perkin Elmer Lambda 1050. The team consists of several accessories that allow the measurement of solid and liquid samples as well as three detectors covering regions UVvisNIR. In addition, the team has an accessory of diffuse reflectance of solids "Praying Mantis", which are could attach a cell of atmosphere and temperature controlled for studies on reaction conditions

Laser RAMAN JASCO NRS5100 spectrophotometer. The equipment allows to perform trials both in solid samples such as liquid, consisting in of two laser light sources: 532 nm (green) and 785 nm (red) and a confocal microscope with a set of lenses with different magnification (x 5, x 20, and x 100 as well as one specific reaction cell) that will be selected according to the type of sample and the experiment. In addition, experiments in operating conditions are carried out through the use of a cell of reaction temperature and controlled atmosphere

Two Infrared spectrophotometer by Fourier Thermo Fischer equipped with different modules which allow different experiment according to the nature of the sample or the operating conditions. It has an accessory of diffuse reflectancia "Praying Mantis" with reaction Chamber, allowing the experiment to temperature and controlled atmosphere. In addition, it is equipped with a cell of infrared analysis gases that can be coupled to an output of a reactor gases or other characterization equipment

Near Field AFM probe microscope. Park XE100. The team has the possibility of working in mode no real contact, dynamic contact mode and contact mode. It is possible to work by controlling both the atmosphere and the temperature of the sample, both liquid as solid. In addition, it is equipped with a cell that allows electrochemical testing and insitu measuring the topography of the materials. On the other hand has different modules measure MFM, STM, TrPCM, EFM. It includes various modes active as SKPM or DCEFM among others.